Unlike general conveyors, clean conveyor systems used in FAB should support the following characteristics.
01
Maintain Cleanliness that can be operated in the Clean Room
(Cleanness, Class 100 or ISO 5 or below)
02
Operate accurate stop position precision for interfacing with the OHT
03
Electrostatic discharge (ESD) is supported depending
on the process in which the conveyor is used
04
Low vibration level (<1G or less) designed to prevent
damage to the wafer contained in the FOUP
05
Fast transportation to increase semiconductor
manufacturing yield
In the semiconductor manufacturing plant, the clean conveyor system is
01
Equipment and another equipment
02
Equipment and Storage Devices
03
FAB and another FAB
In the FAB, a clean conveyor system is responsible for wafer transfer between Equipment and another equipment, Equipment and Storage Devices and FAB and another FAB to maximize the movement of the carrier within the FAB and reduce the load on the overhead hoist transport (OHT) system. Also, it is responsible for increasing the efficiency of overall semiconductor production.
